Measurement of Silicon Wafer Thickness Using a Double Focus Lens.
نویسندگان
چکیده
منابع مشابه
Silicon Wafer Thickness Variation Measurements using Infrared Interferometry
Tony L. Schmitz, Angela Davies, Chris J. Evans National Institute of Standards and Technology, Gaithersburg, MD 20899 Robert E. Parks Optical Perspectives Group, LLC, Tucson, AZ
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ژورنال
عنوان ژورنال: TRANSACTIONS OF THE JAPAN SOCIETY OF MECHANICAL ENGINEERS Series C
سال: 2001
ISSN: 0387-5024,1884-8354
DOI: 10.1299/kikaic.67.2051